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Small Drawer Type Perovskite UV Light Cleaning Machine for Small Substrate Cleaning Such as ITO And FTO

Small Drawer Type Perovskite UV Light Cleaning Machine for Small Substrate Cleaning Such as ITO And FTO

Sales Manager: Gia
Email: Gia@tmaxlaboratory.com
Wechat: Dingqiuna

  • Item No.:

    TMAX-BZS
  • Certificate:

    CE Certified
  • Warranty:

    1 Year limited warranty with lifetime support
Product Details

Small Drawer Type Perovskite UV Light Cleaning Machine for Small Substrate Cleaning Such as ITO And FTO


Ultrasonic Cleaning Machine

UV light cleaning machine BZS250GF-TC has industrial level cleaning efficiency and effect, suitable for small substrate cleaning, such as liquid crystal panel, ITO, FTO, optical glass, OLED, LCD, silicon, ceramic, metal sheet, polymer, silicone and other surface cleaning, for cleaning the surface organic matter of the product, that is, surface modification. Thus better hydrophilicity is obtained.


A. Product configuration

Serial number

Description

Model number

BZS200GF-TC

BZS250GF-TC

BZS320GF-TC

1

Material of complete machine

The whole machine is made of mirror stainless steel 304, and the key components are made of Schneider, Omron and other brands

2

Power supply

220V,250W

220V,300W

220V,350W

3

Lamp power

200W

250W

320W

4

Cleaning size

150*150mm

200*200mm

250*250mm

5

Lamp material technology

Japanese pure quartz material, one shape grille lamp

6

Operating spectrum

185+254nm

7

Lamp life

8000 hours

8

Time frame

0-99 minutes/hour

9

Irradiation height

0-100mm

10

Light assist

High performance reflector

11

Heating (optional)

Heating range from room temperature to 300℃

12

Safety protection

The lamp goes out automatically when the drawer is pulled out

13

Cue light

Exception indication/alert

14

Exhaust function

With ozone exhaust system, 125mm diameter outlet, equipped with air pipes and fasteners

15

Overall dimension

350W*400L*350H (mm)

450L*390W*350H (mm)

16

Weight

20kg

22kg



B. Application field

■ Clean the substrate prior to film deposition. Scum removal and stabilization of photoresist treatment. Ultra-high vacuum seal.

■ Clean silicon chips, lenses, mirrors, solar panels, cold rolled steel, inertial guidance parts and GaAs chips

■ Clean flux, mixing circuit and flat panel LCD display

■ Etch Teflon, fluororubbers and other organic materials

■ Enhanced GaAs and Si oxide passivation surface

■ Enhance the degassing effect of glass

■ Substrate blue film removal

■ Enhance the adhesion of the coating on the plastic surface

■ Clear ink stain after final test of substrate

■ Remove photoresist

■ Flat panel display/LCD display

■ Remove residuals from the lithographic machine

■ Clean the circuit board before packaging and taping)

■ Optical fiber

■ Enhanced surface hydrophilic properties

■ Cleaning and disinfection for bioscience applications

■ Optical lens

■ Other applications

 

C. Cleaning effect

The cleaning effect is generally tested by the substrate surface hydrophilicity, that is, the contact Angle

    








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