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Item No.:
TMAX-RFPowerPayment:
L/C, T/T, Western Union, Credit Cards, PaypalShipping port:
Xiamen PortLead Time:
5 DaysCertificate:
CE, IOS, ROHS, SGS, UL CertificateWarranty:
Two years limited warranty with lifetime technical supportRF Power Supply for PECVD
The PECVD system consists of a tube furnace, a quartz vacuum chamber, a vacuum system, a gas supply system, and a radio frequency power supply system. Mainly used for: growth of metal thin films, ceramic thin films, composite thin films, graphene, etc. It is easy to add functions, and can expand functions such as plasma cleaning and etching. The PECVD system has the advantages of high film deposition rate, good uniformity, high consistency and stability.
Main technical parameters of RF power supply:
Power output range |
0-500W |
Maximum reflected power |
200W |
working frequency |
RF:13.56MHZ±0.005% |
Power stability |
+/-0.1% |
Harmonic component |
≤-50dbc |
Rf region width |
0-600mmadjustable |
Matching way |
automatic |
Cooling mode |
Points of cold |
Noise |
<50dB |
Radio frequency interface |
50Ω N-type |
Input power |
208-240V 50/60HZ |
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
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1600C CVD Furnace with Gas Supply System and Vacuum SystemNext :
VS-0.1 Vacuum System with VRD16 Vacuum Pump for CVD SystemCategories
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